During the past years, elliposometry, a non-destructive and contact-less optical surface analysis technique, has gained increased importance in industrial areas, such as the technology of electronic devices, when simple instruments, many of them computer-controlled and automated, became available. The potential users of such instruments are, however, frequently aware neither of the inherent possibilities of this technique, nor of its accuracy limitations. This book endeavors to point out some of the less obvious features and possibilities of ellipsometry, particularly of dynamic "in situ" measurements, and reviews its applications in research and manufacturing of semiconductor and thin film devices. A comprehensive discussion of various error effects typical particularly for simple ellipsometers and of their impact on measured sample parameters is provided. Error correction or (numerical) calibration procedures are given wherever possible, and design and operation guidelines for high-speed instruments suitable for dynamic "in situ" measurements are suggested.
Authors: Riedling, Karl. Bibliographic Information.
Authors: Riedling, Karl. price for USA in USD (gross). ISBN 978-3-7091-8961-0.
Lue tämä kirja käyttämällä Google Play Kirjat ‑sovellusta tietokoneella tai Android- tai iOS-laitteella. A comprehensive discussion of various error effects typical particularly for simple ellipsometers and of their impact on measured sample parameters is provided.
Ellipsometry in Microelectronic Technology. . Semiconductor Substrates and Films. Insulating Films. Etching Processes. 3. Error Effects in Ellipsometric Investigations. Random Measurement Errors. Instrumentation Error Effects. 1 Null Ellipsometers. 2 Numerical Alignment. 2 Rotating Analyzer Ellipsometers. 1 Intrinsic Accuracy. 2 Angular Encoder Orbiting. 3 Periodic and Random Noise. 1. Basics of Ellipsometry.
In the final chapter, the applications of spectroscopic ellipsometry for growth monitoring and feedback control of.
In the final chapter, the applications of spectroscopic ellipsometry for growth monitoring and feedback control of processing are addressed.
Ellipsometry is a powerful tool used for the characterization of thin films and multi-layer semiconductor structures. This book deals with fundamental principles and applications of spectroscopic ellipsometry (SE). Beginning with an overview of SE technologies the text moves on to focus on the data analysis of results obtained from SE, Fundamental data analyses, principles and physical backgrounds and the various materials used in different fields from LSI industry to biotechnology are described
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1. For example, a normalization procedure is developed which determines equivalent optical anisotropic states of films. This allows films produced by different multiaxial fabrication processes to be compared. Similarly, procedures are described for characterizing the crystallinity, the angular optical distribution in the plane of the film, and other interesting applications of the refractive index information.